| Industry |
Name of Project |
Date |
Capacity (m³/day) |
Process |
Work Scope |
| Microelectronics |
Electronics Water Treatment Facilities of Anam Industrial Co., Ltd. |
1997 |
6,500 |
Physical+Chemical |
EPC |
| Microelectronics |
Electronics Wastewater Treatment Facilities of Sungwoo Electronics Co., Ltd. |
1997 |
3,000 |
Physical+Chemical |
EPC |
| Iron/Steel |
CRM DEMI & Water Treatment Plant of HDP |
1997 |
170 |
Physical / Chemical |
EP/SV |
| Microelectronics |
Abrasive / Cr / Cullet Water Treatment Facilities of Samsung Corning Co., Ltd. |
1997 |
2,760 |
Physical+Chemical |
EPC |
| Oil&Gas/Chemistry |
Daesan Plant Demineralization System Expansion |
1996 |
5,568 |
Ion Exchange |
EPC |
| Oil&Gas/Chemistry |
Onsan p-Xylene Plant Demineralization System |
1996 |
4,800 |
Ion Exchange |
EPC |
| Oil&Gas/Chemistry |
Oil Refining D.I Water Treatment Plant |
1996 |
400 |
Ion Exchange |
EPC |
| Microelectronics |
Electronics Water Treatment Facilities of LG Electronics Inc. |
1996 |
715 |
Physical+Chemical |
EPC |
| Microelectronics |
Puchon Dormitory Sewage Treatment Facilities of Samsung Electronics Co., Ltd. |
1996 |
500 |
Standard Activated Sludges process |
EPC |
| Microelectronics |
Anam Electronics Water Treatment Facilities |
1996 |
3,600 |
Physical+Chemical |
EPC |
